World-Class Resources > Metrology Labs > Analytical & Characterization Techniques > FEI Nova-600 ESEM

• FE-SEM operating at high chamber pressure – no coating required for insulating samples
• Beam diameter 1.6nm @ 1keV
• Beam landing energy as low as 50eV
• Sub-1keV backscatter imaging
• Sample size up to 6” x 6” (litho mask)

Typical applications: photoresist features; lithography masks; defect characterization

ESEM Data

Cr on quartz photolithography mask Toth, Knowles & Thiel (2006) APPLIED PHYSICS LETTERS 88, 023105