World-Class Resources > CNSE Wafer Processing Research & Development > Mask Sets > Integrated Planar CMOS

90 nm 65 nm 32 nm

• Shallow Trench Isolation
  • Min CD = 100nm
    • Retrograde Wells
    • Hi-k / MG
  • ALD & MOCVD Hi-k
  • ALD, CVD & PVD MG
• Halo / Extension Implants

• Oxide / Nitride Spacer
• Nickel Silicide
• Copper Contact
• Testable Structures at M1