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ASML 300mm ADT EUV
CNSE is pleased to have received the world’s first extreme ultraviolet (EUV) Alpha Demo Tool (ADT). This $65 million dollar tool represents a critical step in the development and commercialization of EUV technology, vital to the future of nanoelectronics manufacturing.
Developed by Netherlands-based ASML Holding NV (ASML), the leading global supplier of advanced lithography tools, the EUV ADT is the world's first full-field EUV tool. This R&D tool has been essential in development of the infrastructure for EUV lithography, considered the most likely technology to address the 32nm computer chip device node, based on cost-effectiveness and ability to extend to future nodes, according to ASML.
Now integrated into CNSE's Albany NanoTech complex, the EUV ADT will support the R&D programs of the $600M International Venture for Nanolithography (INVENT), a global industry-university consortium for research and development, education and technology deployment for future generations of nanolithography applications.
|300MM EUV Patterning |
|Trench ||Line |
| ||1:1 |
| || |
| ||35 nm L/S |
|35 nm |
|35 nm |