World-Class Resources > CNSE Wafer Processing Research & Development > Lithography and Patterning Tools > ASML 1950i 193nm

ASML 1950i 193nm ‘"Immersion" Tool Capable of 22nm Imaging

ASML's Twin Scan NXT:1950i system is a dual-stage, 193-nm immersion lithographic exposure tool designed for volume production 300-mm wafers at the 32-nm node. Recently, utilizing optical extension techniques, the resolution of the 1950i may be better stated as 32nm resolution and beyond as sub 32nm resolution is being demonstrated. The NXT:1950i has a numerical aperture (NA) of 1.35.