World-Class Resources > CNSE Wafer Processing Research & Development > Lithography and Patterning Tools > ASML 1700i 193nm

ASML 1700i 193nm "Immersion" Tool Capable of 50nm Imaging

The ASML TWINSCAN XT:1700i system is a 193 nm immersion scanner capable of volume semiconductor chip production at the 45 nm node; the system has a numerical aperture of 1.2.

Utilizing double exposure and various diffractive optical elements (DOEs) the resolution of the 1700i has been driven below the 65nm early target for the tool. CNSE has published articles at SPIE that depict the tremendous capability of the 1700i.