More than $600 million in total public/private sector funds have been committed to INVENT’s development. The state’s commitment to INVENT, led by Assembly Speaker Sheldon Silver and members of the Capital Region’s Assembly delegation, was demonstrated by a $75 million allocation for the UAlbany facility that was contained in the state budget, building on the Assembly’s prior commitments to CNSE's Albany NanoTech complex of more than $30 million.
Private-industry partners for the new INVENT model, which vertically integrates the technical capabilities and financial resources of leading computer-chip manufacturers, include Advanced Micro Devices (AMD), ASML, Qimonda, International Business Machines (IBM) and Micron Technology, with the state-of-the-art facilities at CNSE affording the companies access to the largest, most leveraged, private partnership to develop and deploy nanolithography solutions.
INVENT program extreme ultraviolet lithography (EUVL) plans:
Resists
Goal: Develop resist process for <=32nm node
Approach: Screening & characterization of promising commercial resists on AD-10
Reticles
Goal: Understand defect issues and lifetime under storage & exposure conditions
Approach: Establish methodologies for reticle cleans and metrology with suppliers
Process
Goal: Assess EUVL process technology including RET & tool performance on imaging & overlay
Approach: Integrate EUVL tool in process flow
Tool
Goal: Determine EUVL α-tool performance and reliability
Approach: Work closely with ASML to meet INVENT member-specified tool performance